The goal of the PUNCHY emerging project is to develop PolyMethylMethacrylate (PMMA) polymers that are sensitive to photons in the UV region, enabling their compatibility with advanced UV photolithography technology based on Digital Micromirror Devices (DMD). While PMMA is widely recognized and commonly used as an electron-sensitive resist in electron beam lithography, this project aims to expand its capabilities under UV exposure. Specifically, it seeks to demonstrate these enhanced functionalities through two innovative approaches: (i) as a positive/negative photoresist for fabricating graphene-based patterns with submicrometer resolution, and (ii) as a photoelectret in nanoxerography experiments to create charged patterns over large surfaces (> cm²) with a stamp/mold free method.
LPCNO / Nanotech team
PALLEAU Etienne epalleau@insa-toulouse.fr