The goal of the PUNCHY emerging project is to develop PolyMethylMethacrylate (PMMA) polymers that are sensitive to photons in the UV region, enabling their compatibility with advanced UV photolithography technology based on Digital Micromirror Devices (DMD). While PMMA is widely recognized and commonly used as an electron-sensitive resist in electron beam lithography, this project aims to expand its capabilities under UV exposure. Specifically, it seeks to demonstrate these enhanced functionalities through two innovative approaches: (i) as a positive/negative photoresist for fabricating graphene-based patterns with submicrometer resolution, and (ii) as a photoelectret in nanoxerography experiments to create charged patterns over large surfaces (> cm²) with a stamp/mold free method.
Principle of the DMD photolithography technology which will be used on UV sensitive PMMA and its applications in patterning of 2D materials and nanoxerography.
Research project selected under the 2025 call for proposals
Principal Investigator : Étienne PALLEAU
Involved Teams :
- LPCNO/Nanotech
Research project selected under the 2025 call for proposals
Type of project : Disruptive Project
Date (start/end) : 2025